Wrinkling of a debonded initially compressed Si1-xGex film

Journal of Mechanics

Volumn 21, Issue 3, 2005, Pages 131-135

  Fedorchenko, A I ^a   Wang, A B ^a   Mashanov, V I ^b   Cheng, H H ^b  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Si Ge alloys; Stress relaxation; Thin films; Wrinkling

Indexed keywords

CHEMICAL BONDS; ETCHING; MATHEMATICAL MODELS; POISSON RATIO; SILICON ALLOYS; STRESS RELAXATION;

SI-GE ALLOY; SPACE PERIODICITY; STRETCHING ENERGY; WRINKLING;

THIN FILMS;

EID: 25444498624     PISSN: 17277191     EISSN: None     Source Type: Journal    
DOI: 10.1017/S1727719100000563     Document Type: Article

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