Photolithographic fabrication of waveguides

American Ceramic Society Bulletin

Volumn 82, Issue 9, 2003, Pages

  Turnbull, D A ^a   Sanghera, J S ^a   Nguyen, V Q ^a   Aggarwal, I D ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERA IMAGES; QUARTZ AMPOULES; RADIO-FREQUENCY SPUTTERING; SURFACE OF LOSS;

GERMANIUM; MICROCRACKS; PHOTOLITHOGRAPHY; PHOTORESISTS; QUARTZ; SPUTTERING;

OPTICAL WAVEGUIDES;

EID: 25444484397     PISSN: 00027812     EISSN: 00027812     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (6)

1. K. Kobayashi, Proc. Soc. Photo-Opt. Instrum. Eng., 3896, 46 (1999).
2. J.S. Sanghera and I.D.Aggarwal, J. Non-Cryst Solids, 256 & 257, 6 (1999).
3. J.M. Harbold, F.O. Ilday, F.W.Wise, J.S. Sanghera,V.Q. Nguyen, L.B. Shaw and I.D.Aggarwal, Opt Lett., 27, 119 (2002).
4. J.F.Viens, C. Meneghini,A.Villanueve,T.V. Galstain, E.J. Knystautas, M.A. Duguay, K.A. Richardson and T. Cardinal, J. Lightwave Technol.,17, 1184 (1999).
5. S. Ramachandran and S.G. Bishop, Appl. Phys. Lett., 74, 13 (1999).
6. P.K.Tien,Appl. Opt., 10, 2395 (1971).