Studies of Ti- and Ni-germanide Schottky contacts on n-Ge(1 0 0) substrates

Microelectronic Engineering

Volumn 82, Issue 2, 2005, Pages 93-98

  Han, Dedong ^a   Wang, Yi ^a   Tian, Dayu ^a   Wang, Wei ^a   Liu, Xiaoyan ^a   Kang, Jinfeng ^a   Han, Ruqi ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

Ge; Ni Germanide; Schottky Contacts

Indexed keywords

ANNEALING; FURNACES; GERMANIUM; LOW TEMPERATURE EFFECTS; NICKEL COMPOUNDS; SPUTTERING; SUBSTRATES; TITANIUM COMPOUNDS;

FURNACE ANNEALING; NI-GERMANIDE; SCHOTTKY CONTACTS; SPUTTERING METAL;

SCHOTTKY BARRIER DIODES;

EID: 25444473447     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.06.004     Document Type: Article

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