Atomic force microscope anodization lithography using pulsed bias voltage synchronized with resonance frequency of cantilever

Nanotechnology

Volumn 16, Issue 10, 2005, Pages 2082-2085

  Bae, Sukjong ^a   Han, Cheolsu ^a   Kim, Moo Sub ^a   Choo Chung, Chung ^a   Lee, Haiwon ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CANTILEVER BEAMS; ELECTRIC POTENTIAL; LITHOGRAPHY; NATURAL FREQUENCIES; OXIDES; PULSE MODULATION;

APPLIED BIAS VOLTAGE; ATOMIC FORCE MICROSCOPES; OXIDE PATTERNS; PULSE MODULATORS;

ANODIC OXIDATION;

EID: 25444431753     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/10/017     Document Type: Article

References (21)

1. Lopez G P, Biebuyck H A and Whitesides G M 1993 Langmuir 9 1513
2. Chou S Y, Krauss P R and Renstrom P J 1996 Science 272 85
3. Kurihara K 1984 J. Vac. Sci. Technol. B 3 41
4. Dagata J A, Schneir J, Harary H H, Evans C J, Posteck M T and Bennett J 1990 Appl. Phys. Lett. 56 2001
5. Snow E S, Park D and Campbell P M 1996 Appl. Phys. Lett. 69 269
6. Villarroya M, Perez-Murano F, Martin C, Davis Z, Boisen A, Esteve J, Figueras E, Montserrat J and Barniol N 2004 Nanotechnology 15 771
7. Gordon A E, Fayfield R T, Litfin D D and Higman T K 1995 J. Vac. Sci. Technol. B 13 2805
8. Lyuksyutov S F, Paramonov P B, Dolog I and Ralich R M 2003 Nanotechnology 14 716
9. Majumdar A, Oden P I, Carrejo J P, Nagahara L A, Graham J J and Alexander J 1992 Appl. Phys. Lett. 61 2293
10. Dubois E and Bubendorff J 2000 J. Appl. Phys. 87 8148
11. Avouris P, Hertel T and Martel R 1997 Appl. Phys. Lett. 71 285
12. Stievenard D, Fontaine P A and Dubois E 1997 Appl. Phys. Lett. 70 3272
13. Calleja M and Garcia R 2000 Appl. Phys. Lett. 76 3427
14. Kim S M and Lee H 2003 J. Vac. Sci. Technol. B 21 2398
15. Lee W, Kim E R and Lee H 2002 Langmuir 18 8375
16. Lee H S, Kim S A, Ahn S J and Lee H 2002 Appl. Phys. Lett. 80 2592
17. Park J Y and Lee H 2004 Mater. Sci. Eng. C 24 311
18. Legrand B, Deresmes D and Stievenard D 2002 J. Vac. Sci. Technol. B 20 862
19. Legrand B and Stievenard D 1999 Appl. Phys. Lett. 74 4049
20. Perez-Murano F, Birkelund K, Morimoto K and Dagata J A 1999 Appl. Phys. Lett. 75 199
21. Calleja M, Anguita J, Garcia R, Birkelund K, Perez-Murano F and Dagata J A 1999 Nanotechnology 10 34