Water-related matrix isolation phenomena during NO2 photolysis in argon matrix

Applied Spectroscopy

Volumn 58, Issue 5, 2004, Pages 528-534

  Cocke, David L ^a   Gomes, Jewel A G ^a   Gossage, John L ^a   Li, Kuyen ^a   Lin, Che Jen ^a   Tandel, Satish ^a  

^a Lamar University   (United States)

Author keywords

Dangling OH; Fourier transform infrared spectroscopy; FT IR spectroscopy; Matrix isolation; Nanoparticulate ice; NO2 photolysis; Photon induced desorption

Indexed keywords

ARGON; CHEMICAL BONDS; DESORPTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOLECULAR STRUCTURE; NANOSTRUCTURED MATERIALS; NITROGEN OXIDES; WATER;

NANOPARTICULATE ICE; PHOTON INDUCED DESORPTION; WATER RELATED MATRIX ISOLATION PHENOMENA;

PHOTOLYSIS;

EID: 2542569458     PISSN: 00037028     EISSN: None     Source Type: Journal    
DOI: 10.1366/000370204774103345     Document Type: Article

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