Electrospray sample deposition for matrix-assisted laser desorption/ionization (MALDI) and atmospheric pressure MALDI mass spectrometry with attomole detection limits

Rapid Communications in Mass Spectrometry

Volumn 18, Issue 11, 2004, Pages 1193-1200

  Wei, Hui ^a   Nolkrants, Kerstin ^a   Powell, David H ^c   Woods, James H ^b   Ko, Mei Chuan ^b   Kennedy, Robert T ^a,b  

^a UNIVERSITY OF MICHIGAN   (United States)

^b UNIVERSITY OF MICHIGAN MEDICAL SCHOOL   (United States)

^c University of Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; DESORPTION; ELECTRIC GROUNDING; FUSED SILICA; MASS SPECTROMETERS; MASS SPECTROMETRY;

ATTOMOLE DETECTION LIMITS; DETECTION LIMITS; ELECTROSPRAYS; MATRIX; MATRIX ASSISTED LASER DESORPTION IONIZATION; MATRIX-ASSISTED LASER DESORPTION IONIZATION MASS SPECTROMETRY; MATRIX-ASSISTED LASER DESORPTION/IONIZATION-TIME-OF-FLIGHT MASS SPECTROMETRY; MATRIXASSISTED LASER DESORPTION-IONIZATION (MALDI); NANOLITERS; SAMPLE DEPOSITION;

ATMOSPHERIC PRESSURE;

ALPHA CYANO 4 HYDROXYCINNAMIC ACID; NEUROPEPTIDE; NEUROTENSIN DERIVATIVE; NEUROTENSIN[1-11]; UNCLASSIFIED DRUG;

ARTICLE; ATMOSPHERIC PRESSURE; CAPILLARY ELECTROPHORESIS; CRYSTAL STRUCTURE; DRUG MIXTURE; ELECTRIC POTENTIAL; ELECTROSPRAY; ELECTROSPRAY MASS SPECTROMETRY; ELECTROSPRAY SAMPLE DEPOSITION; ION TRAP MASS SPECTROMETRY; MASS SPECTROMETRY; MATRIX ASSISTED LASER DESORPTION IONIZATION TIME OF FLIGHT MASS SPECTROMETRY; METHODOLOGY; NANOTECHNOLOGY; SENSITIVITY ANALYSIS; SENSITIVITY AND SPECIFICITY; VOLATILIZATION; WET DEPOSITION;

EID: 2542566672     PISSN: 09514198     EISSN: None     Source Type: Journal    
DOI: 10.1002/rcm.1458     Document Type: Article

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