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Journal of Physics D: Applied Physics

Volumn 37, Issue 10, 2004, Pages 1429-1433

Structure and magnetic properties of RF sputtered Fe-N films

(6) Chen, Y F a Jiang, E Y a Li, Z Q a Mi, W B a Wu, P a Bai, H L a

a TIANJIN UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; IRON COMPOUNDS; MAGNETIC PROPERTIES; MAGNETIZATION; MAGNETRON SPUTTERING; NITROGEN COMPOUNDS; PARTIAL PRESSURE; SILICON COMPOUNDS; TEMPERATURE CONTROL; THICKNESS CONTROL;

FILM THICKNESS; PHASE FORMATION; RF MAGNETRON SPUTTERING; TORR;

MAGNETIC FILMS;

EID: 2542555972 PISSN: 00223727 EISSN: None Source Type: Journal
DOI: 10.1088/0022-3727/37/10/003 Document Type: Article

Times cited : (18)

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