Cold-wall UHV-CVD for Si-SiGe(C) epitaxial thin films

Solid State Technology

Volumn 45, Issue 11, 2002, Pages 49-50

  Mashiro, Supika ^a   Date, Hiroki ^a   Hitomi, Satoshi ^a   Sakai, Junro ^a  

^a Canon ANELVA Technix Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 2542494739     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (3)

1. K. Aketagawa, et al., Jpn. J. Appl. Phys., Vol. 31, pp. 1432-1435.
2. T. Tatsumi, et al., J. of Crystal Growth, Vol. 120, pp. 275-278.
3. K.L. Knutson, et al., J. of Crystal Growth, Vol. 140, pp. 191-194.