Dense arrays of nanopores as x-ray lithography masks

Applied Physics Letters

Volumn 84, Issue 17, 2004, Pages 3388-3390

  Knaack, S A ^a   Eddington, J ^a   Leonard, Q ^a   Cerrina, R ^a   Onellion, M ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMICAL BATHS; MICROGRAPHS; X-RAY MASKS;

ELECTROLYSIS; FAST FOURIER TRANSFORMS; LIGHT SOURCES; MASKS; PHOTORESISTS; PROFILOMETRY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR QUANTUM DOTS; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

NANOSTRUCTURED MATERIALS;

EID: 2542489351     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1705724     Document Type: Article

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