Direct electron-beam lithography on opal films for deterministic defect fabrication in three-dimensional photonic crystals

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 362-366

  Ferrand, P ^a   Seekamp, J ^a   Egen, M ^b   Zentel, R ^b   Romanov, S G ^a   Torres, C M Sotomayor ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

^b JOHANNES GUTENBERG UNIVERSITY   (Germany)

Author keywords

Electron beam lithography; Opal; Photonic crystals; Polymer; Self assembly

Indexed keywords

CRYSTAL GROWTH; CRYSTALS; ELECTRON BEAM LITHOGRAPHY; LIGHT EMISSION; MICROSCOPIC EXAMINATION; OPTIMIZATION; OPTOELECTRONIC DEVICES; POLYMERS; SELF ASSEMBLY; SEMICONDUCTOR MATERIALS; VLSI CIRCUITS;

OPAL FILMS; OPTICAL DIFFRACTION; PHOTONIC CRYSTALS;

PHOTONS;

EID: 2542480367     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00126-1     Document Type: Conference Paper

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