Statistical analysis of topographic images of nanoporous silicon and model surfaces

Microelectronics Journal

Volumn 36, Issue 11, 2005, Pages 1011-1015

  Da Silva Jr , J B ^a   De Vasconcelos, E A ^a   Dos Santos, B E C A ^a   Freire, J A K ^b   Freire, V N ^b   Farias, G A ^b   Da Silva Jr , E F ^a  

^a FEDERAL UNIVERSITY OF PERNAMBUCO   (Brazil)

^b FEDERAL UNIVERSITY OF CEARÁ   (Brazil)

Author keywords

Atomic force microscopy; Fractal analysis; Porous silicon; Random rough surfaces; Self affine surfaces

Indexed keywords

ATOMIC FORCE MICROSCOPY; FABRICATION; IMAGE ANALYSIS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; STATISTICAL METHODS; SURFACE TOPOGRAPHY;

FRACTAL ANALYSIS; RANDOM ROUGH SURFACES; SECOND-ORDER STATISTICAL ANALYSIS; SELF-AFFINE SURFACES;

POROUS SILICON;

EID: 25144525564     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2005.04.007     Document Type: Conference Paper

References (2)

1. Y. Zhao, G.-C. Wang, and T.-M. Lu Characterization of Amorphous and Crystalline Rough Surfaces: Principles and Applications first ed. 2001 Academic Press San Diego
2. E.A. de Vasconcelos, E.F. da Silva Jr., B.E.C.A. dos Santos, W.M. de Azevedo, and J.A.K. Freire A new method for luminescent porous silicon formation: reaction-induced vapor-phase stain etch L.T. Canham A. Nassiopoulou V. Parkhutik Porous Semiconductors: Science and Technology - 2004 2004 Universidad Politécnica de Valencia Valencia 236 237