The mechanism of striation formation in plasma display panels

Journal of Applied Physics

Volumn 98, Issue 4, 2005, Pages

  Iza, F ^a   Yang, S S ^a   Kim, H C ^a   Lee, J K ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

INELASTIC COLLISIONS; LOW-ENERGY ELECTRONS; STRIATION; SURFACE CHARGES;

ANODES; COMPUTER SIMULATION; DIELECTRIC MATERIALS; ELECTRONS; MONTE CARLO METHODS; PRESSURE EFFECTS; TWO DIMENSIONAL;

PLASMA DISPLAY DEVICES;

EID: 25144508070     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2007851     Document Type: Article

References (23)

1. Y. P. Raizer, Gas Discharge Physics (Springer, Berlin, New York, 1991).
2. M. M. Turner and D. Vender, Abstracts for the IEEE International Conference on Plasma Science, June 2000, IEEE International Conference on Plasma Science, New Orleans, LA, 4-7 June 2000 (IEEE, New York, 2000), p. 163.
3. V. I. Kolobov and V. A. Godyak, IEEE Trans. Plasma Sci. 23, 503 (1995).
4. H. C. Kim and J. K. Lee, Phys. Rev. Lett. 93, 085003 (2004).
5. H. C. Kim, G. Y. Park, and J. K. Lee, Appl. Phys. Lett. (submitted).
6. Y. B. Golubovskii, V. A. Maiorov, I. A. Porokhova, and J. Behnke, J. Phys. D 32, 1391 (1999).
7. J. P. Verboncoeur, A. B. Langdon, and N. T. Gladd, Comput. Phys. Commun. 87, 199 (1995).
8. C. K. Birdsall and A. B. Langdon, Plasma Physics Via Computer Simulation (IOP, Bristol, UK, 1991).
9. S. Rauf and M. J. Kushner, J. Appl. Phys. 0021-8979 10.1063/1.369703 85, 3460 (1999); S. Rauf and M. J. Kushner, J. Appl. Phys. 85, 3470 (1999).
10. S. Rauf and M. J. Kushner, J. Appl. Phys. 0021-8979 10.1063/1.369703 85, 3460 (1999); S. Rauf and M. J. Kushner, J. Appl. Phys. 85, 3470 (1999).
11. C. Punset, J. P. Boeuf, and L. C. Pitchford, J. Appl. Phys. 83, 1884 (1998).
12. C. H. Shon and J. K. Lee, Phys. Plasmas 8, 1070 (2001).
13. G. Cho, E. H. Choi, Y. G. Kim, D. I. Kim, H. S. Uhm, Y. D. Joo, J. G. Han, and M. C. Kim, J. Appl. Phys. 87, 4113 (2000).
14. T. Yoshioka, A. Okigawa, L. Tessier, and K. Toki, Proceedings of the 6th International Display Workshop, Sendai, Japan, 1-3 December 1999 (Society for Information Display, San Jose, CA, 1999), p. 603.
15. Y. B. Golubovskii, V. A. Maiorov, I. A. Porokhova, and J. Behnke, J. Phys. D 32, 1391 (1999).
16. Th. Callegari, R. Ganter, and J. P. Boeuf, J. Appl. Phys. 88, 3905 (2000).
17. Kinema Software, http://www.siglo-kinema.com/bolsig.htm
18. M. A. Lieberman and A. J. Lichtenberg, Principle of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
19. R. Ganter, J. Ouyang, Th. Callegari, and J. P. Boeuf, J. Appl. Phys. 91, 992 (2002).
20. S. Hassaballa, Y. K. Kim, Y. Yamagata, K. Uchino, H. Hatanaka, Y. M. Kim, S. E. Lee, S. H. Son, and S. H. Jang, Proceedings of the 11th International Display Workshop, Niigata, Japan, 8-10 December 2004 (Society for Information Display, San Jose, CA, 1999), p. 863.
21. K. Tachibana, S. Feng, and T. Sakai, J. Appl. Phys. 88, 4967 (2000).
22. R. M. Sankaran, K. P. Giapis, D. Holunga, and R. C. Flagan, AVS 51st International Symposium and Exhibition, Anaheim, CA, 14-19 November 2004 (AVS The Science and Technology Society, New York, 2004), p. 179.
23. F. Iza and J. Hopwood, IEEE Trans. Plasma Sci. 33, 306 (2005).