Low temperature and high strain rate superplasticity of the electrodeposited Ni/Si3N4(W) composite

Scripta Materialia

Volumn 53, Issue 11, 2005, Pages 1285-1290

  Chan, K C ^a   Wang, G F ^a   Wang, C L ^a   Zhang, K F ^b  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Electrodeposition; High strain rate superplasticity; Ni Si3N4(w) composite

Indexed keywords

DEFORMATION; ELECTRODEPOSITION; STRAIN RATE; SYNTHESIS (CHEMICAL);

DEFORMATION MECHANISM; STRAIN RATE SUPERPLASTICITY; TENSILE SUPERPLASTICITY;

SUPERPLASTICITY;

EID: 25144455584     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2005.07.029     Document Type: Article

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