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Volumn 31, Issue 6, 2004, Pages 8-11

Copper-silicon carbide for IGBT thermal management

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER COATINGS; CHEMICAL COMPATIBILITY; POWER DENSITY;

EID: 25144447767     PISSN: None     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (5)

References (6)
  • 3
    • 0034507535 scopus 로고    scopus 로고
    • The role of compound formation in reactive wetting: The Cu/SiC system
    • C. Rado, B. Drevet, N. Eustathopoulos,"The Role of Compound Formation in Reactive Wetting: The Cu/SiC System," Acta Materialia, 2000, 48, 4483-4491
    • (2000) Acta Materialia , vol.48 , pp. 4483-4491
    • Rado, C.1    Drevet, B.2    Eustathopoulos, N.3
  • 4
    • 0000899113 scopus 로고
    • Tantalum based diffusion barriers in Si/Cu VLSI metallizations
    • August
    • E.Kolawa,J.S. Chen,J.S. Reid, P.J. Pokela, M.A. Nicolet, "Tantalum Based Diffusion Barriers in Si/Cu VLSI Metallizations,"J.Appl. Phys. 70 (3), 1369-1373 August 1991
    • (1991) J.Appl. Phys. , vol.70 , Issue.3 , pp. 1369-1373
    • Kolawa, E.1    Chen, J.S.2    Reid, J.S.3    Pokela, P.J.4    Nicolet, M.A.5
  • 5
    • 0033350327 scopus 로고    scopus 로고
    • Wetting and adhesion in metal-silicon carbide systems:The effect of surface polarity of SiC
    • C. Rado, S. Kalogeropoulou, N. Eustathopoulos, "Wetting and Adhesion in Metal-Silicon Carbide Systems:The Effect of Surface Polarity of SiC," Scripta. Mater. 42 (2000) pp. 203-208
    • (2000) Scripta. Mater. , vol.42 , pp. 203-208
    • Rado, C.1    Kalogeropoulou, S.2    Eustathopoulos, N.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.