Proximity effects in submicron optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 772, Issue , 1987, Pages 35-41

  Chien, Paul ^a   Chen, Mung ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL ENGINEERING;

DEVICE FABRICATIONS; EXPERIMENTAL CHARACTERIZATION; LINE-WIDTH CONTROL; LITHOGRAPHIC TOOLS; POTENTIAL IMPACTS; PROXIMITY EFFECTS; RESOLUTION LIMITS; SAMPLE SIMULATIONS;

PHOTOLITHOGRAPHY;

EID: 24944578595     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.967031     Document Type: Conference Paper

References (8)

1. A. K. Liu and B. J. Lin, “A Study of Projected Optical Images for Typical IC Mask Patterns Illuminated by Partially Coherent Light, ” IEEE Trans. Electron Devices, ED-30, 1251, 1983.
2. A. E. Rosenbluth, D. Goodman, and B. J. Lin, “A Critical Examination of Submicron Optical Lithography Using Simulated Projection Images, ” J. Vac. Sci. Technol. B1 (4), 1190, 1983.
3. P. D. Robertson, F. W. Wise, A. R. Neureuther, and C. Ting, “Proximity Effects and Influence of Non-Uniform Illumination in Projection Lithography, ” SPIE Vol. 334, Optical Micro-Lithography, 1982.
4. P. D. Planner III, S. Subramanian, A. R. Neureuther, “Two-Dimensional Optical Proximity Effects, ” SPIE Vol. 633, Optical Microlithography V, 1986.
5. E. Ong, B. Singh, A. Neureuther, and R. Ferguson, “Comparison of Proximity Effects in Contrast Enhancement Layer and Bilayer Resist Processes, ” J. Vac. Sci. Technol., 1986.
6. W. G. Oldham, S. N. Nandgonkar, A. R. Neureuther, and M. M. O’Toole, “A General Simulator for VLSI Lithography and Etching Processes: Part I — Application to Projection Lithography, ” IEEE Trans. Electron Devices, ED-26, 717, 1979.
7. M. Yeung, “Modeling Aerial Images in Two and Three Dimensions, ” Proc. of the Kodak Microelectronic Seminar INTERFACE’85, 1985.
8. B.J. Lin, “Partially Coherent Imaging in Two Dimensions and the Theoretical Limits of Projection Printing in Microfabrication”, IEEE Trans. Electron Devices, ED-27, 931, 1980.