Infrared spectroscopic analysis of plasma-treated Si(100)-surfaces

Mikrochimica Acta

Volumn 133, Issue 1-4, 2000, Pages 35-43

  Reiche, Manfred ^a   Wiegand, Marco ^a   Gösele, Ulrich ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

Infrared spectroscopy; Plasma etching; Silicon

Indexed keywords

EID: 24944556846     PISSN: 00263672     EISSN: None     Source Type: Journal    
DOI: 10.1007/s006040070069     Document Type: Article

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