Correlation between target-substrate distance and oxygen pressure in pulsed laser deposition of complex oxide thin films

Applied Physics A: Materials Science and Processing

Volumn 81, Issue 7, 2005, Pages 1503-1507

  Castro Rodriguez R ^a   Coronado, D Reyes ^a   Iribarren, A ^b   Watts, B E ^c   Leccabue, F ^c   Pena J L ^a  

^a DEPARTAMENTO DE FÍSICA APLICADA   (Mexico)

^b UNIVERSITY OF HAVANA   (Cuba)

^c IMEM CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPLEXATION; LASER BEAMS; MATHEMATICAL MODELS; OXIDES; OXYGEN; PRESSURE EFFECTS; THIN FILMS;

COMPLEX OXIDES; METALLIC ELEMENTS; OXYGEN PRESSURES; PLASMA DYNAMICS;

PULSED LASER DEPOSITION;

EID: 24944489943     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-005-3302-5     Document Type: Article

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