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Journal of Non-Crystalline Solids

Volumn 351, Issue 37-39, 2005, Pages 2987-2994

Redox processes in a tin doped melt with the basic composition 20Na 2O·80SiO2 studied by square-wave voltammetry and impedance spectroscopy

(3) Benne, Darja a Keding, Ralf a Rüssel, Christian a

a FRIEDRICH SCHILLER UNIVERSITY JENA (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CHARGE TRANSFER; COMPUTER SIMULATION; DIFFUSION; DOPING (ADDITIVES); EQUIVALENT CIRCUITS; MONOLAYERS; REDUCTION; TIN;

DIFFUSION CONTROLLED CHARGE TRANSFER REACTION; IMPEDANCE SPECTROSCOPY; NEGATIVE POTENTIALS; SQAURE-WAVE VOLTAMMETRY;

REDOX REACTIONS;

EID: 24944484752 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2005.06.048 Document Type: Article

Times cited : (4)

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