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Volumn , Issue , 2002, Pages 2-16

The evolution of the microelectronic bipolar junction transistor

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM GALLIUM ARSENIDE; ELECTRONIC EQUIPMENT; ION IMPLANTATION; MICROELECTRONICS; RECONFIGURABLE HARDWARE; SEMICONDUCTOR DOPING; TEMPERATURE; THERMOELECTRIC EQUIPMENT; TRANSISTORS;

EID: 24944479295     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/EWAED.2002.1177874     Document Type: Conference Paper
Times cited : (3)

References (6)
  • 4
    • 0035506160 scopus 로고    scopus 로고
    • History and future Perspective of the Modern Silicon Bipolar Transistor
    • Nov
    • T.H. Ning, "History and future Perspective of the Modern Silicon Bipolar Transistor". IEEE Trans. on Electron Devices, vol.48, no.11, Nov. 2001.
    • (2001) IEEE Trans. on Electron Devices , vol.48 , Issue.11
    • Ning, T.H.1
  • 5
    • 0035507071 scopus 로고    scopus 로고
    • The Early History of IBM's SiGe Mixed Technology
    • Nov
    • D.L. Harame and S. Meyerson, "The Early History of IBM's SiGe Mixed Technology", IEEE Trans. On Electron Devices, vol.48, no.11, Nov. 2001.
    • (2001) IEEE Trans. on Electron Devices , vol.48 , Issue.11
    • Harame, D.L.1    Meyerson, S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.