Synthesis and characterization of photosensitive polyimides containing alicyclic structure

Polymer (Korea)

Volumn 28, Issue 6, 2004, Pages 494-501

  Jong, Chun Shim ^a   Sung, Mook Choi ^a   Hyun, Bo Sim ^a   Kwon, Soo Han ^b   Mi, Hye Yi ^a  

^a Korea Research Institute of Chemical Technology   (South Korea)

^b Chungbuk National University   (South Korea)

Author keywords

Alicyclic chain polymer; Alkali developable; Good transmittance; Photopatterning; Photosensitive; Polyimide

Indexed keywords

EID: 24744467798     PISSN: 0379153X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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