Novel folding large-scale optical switch matrix with total internal reflection mirrors on silicon-on-insulator by anisotropy chemical etching

Chinese Physics Letters

Volumn 22, Issue 1, 2005, Pages 142-145

  Liu, Jing Wei ^a   Yu, Jin Zhong ^a   Chen, Shao Wu ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ETCHING; MIRRORS; OPTICAL SWITCHES; REFRACTIVE INDEX; SILICON WAFERS;

ANISOTROPY CHEMICAL ETCHING; FOLDINGS; KEY ELEMENTS; LARGE-SCALE OPTICAL SWITCH; LOW-POWER CONSUMPTION; OPTICAL SWITCH MATRIX; REFLECTIVE MIRRORS; SILICON ON INSULATOR; SILICON ON INSULATOR WAFERS; TOTAL INTERNAL REFLECTION MIRROR;

SILICON ON INSULATOR TECHNOLOGY;

EID: 24644514320     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/22/1/041     Document Type: Article

References (16)

1. Chu P B, Lee S and Park S 2002 IEEE Commun. Magazine 40 80
2. Fouquet J E 2000 OFC TUM1
3. Nishimoto H, Suzuki S and Kondo M 1998 Electron. Lett. 24 1122
4. Komatsu K, Hamamoto K, Sugimoto M, Ajisawa A, Kohga Y and Suzuki A 1991 J. Lightwave Technol 9 871
5. Moosburger R and Petermann K 1998 IEEE Photon. Technol. Lett. 10 684
6. Goh T 2001 2001 Proc. SPIE 4582 49
7. Fischer U, Zinke T, Schüppert B and Petermann K 1994 Electron. Lett. 30 406
8. House A, Whitemen R, Kling L, Day S, Knighs A, Hogan D, Hopper F and Asghari M 2003 OFC ThD5
9. Feng T Y 1981 Comput. 14 12
10. Schröder H and Obermeier E 2001 J. Microelectromech. Syst. 10 88
11. Soref R A, Schmidtchen J and Petermann K 1991 IEEE J. Quantum. Electron. 27 1971
12. Xia J and Yu J 2004 Opt. Commun. 230 253
13. Chung Y and Dagli N 1995 Opt. Quantum Electron. 27 395
14. Wiechmam S, Heider H J and Müller J 2003 J. Lightwave Technol. 21 1584
15. Tang Y Z, Wang W H, Li T and Wang Y L 2002 IEEE Photon. Technol. Let. 14 68
16. Wang Z T, Xia J, Fan Z, Chen S and Yu J 2003 Chin. Phys. Lett. 20 2185