Metal-doped carbon films obtained by magnetron sputtering

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 413-417

  Balden, Martin ^a   Cieciwa, B T ^a   Quintana, I ^a   de Juan Pardo, E ^a   Koch, F ^a   Sikora, M ^b   Dubiel, B ^b  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

^b AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

Author keywords

Ceramics, carbides; Diffraction, XRD; Non metals carbon; Spectroscopy, RBS; Structure, crystalline; Structures, nanostructures

Indexed keywords

COMPOSITION EFFECTS; DOPING (ADDITIVES); FILM GROWTH; FILMS; GRAIN SIZE AND SHAPE; HEATING; MAGNETRON SPUTTERING; METALS; NANOSTRUCTURED MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

COLUMNAR GROWTH; DEPOSITION RATES; DOPANT CONCENTRATIONS; FILM COMPOSITION; METAL-DOPED CARBON FILMS;

CARBIDES;

CARBON; FILM;

EID: 24644512834     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.02.218     Document Type: Article

References (20)

1. D. Nilsson F. Svahn U. Wiklund S. Hogmark Wear 254 2003 1084
2. R.G. Agostino et al. Phys. Rev., B 68 2003 035413
3. Y.-Y. Chang D.-Y. Wang W. Wu Thin Solid Films 420-421 2002 241
4. G.D. Lian E.C. Dickey M. Ueno M.K. Sunkara Diamond Relat. Mater. 11 2002 1890
5. S. Inoue Y. Wada K. Koterazawa Vacuum 59 2000 735
6. A.G. Ramirez T. Itoh R. Sinclair J. Appl. Phys. 85 1999 1508
7. V.I. Ivanov-Omskii A.B. Lodygin S.G. Yastrebov Compos. Sci. Technol. 63 2003 1193
8. G. Benedek P. Milani V.G. Ralchenko Nanostructured Carbon for Advanced Applications, NATO Science Series II: Mathematics, Physics and Chemistry vol. 24 2001 Kluwer Academic Press Dordrecht
9. C. Arvieu J.P Manaud J.M. Quenisset J. Alloys Compd. 368 2004 116
10. I. Dahan U. Admon N. Frage J. Sariel M.P. Dariel Thin Solid Films 377-378 2000 687
11. A. Oya H. Marsh J. Mater. Sci. 17 1982 309
12. N. Ordás R. Cemboráin S. Lindig M. Balden H. Wang C. García-Rosales Phys. Scr., T 111 2004 190
13. M. Balden J. Roth E. de Juan Pardo A. Wiltner J. Nucl. Mater. 313-316 2003 348
14. M. Balden E. de Juan Pardo I. Quintana B. Cieciwa J. Roth J. Nucl. Mater. 337-339 2005 980
15. System specification and controlled by own measurements.
16. W.K. Chu J.W. Mayer M.A. Nicolet Backscattering Spectrometry 1978 Academic Press New York
17. M. Mayer SIMNRA User's Guide, Tech. Rep. IPP 9/113 1997 Max-Planck-Institut für Plasmaphysik Garching
18. S.M. Rossnagel in: S.M. Rossnagel J.J. Cuomo W.D. Westwood (Eds.) Handbook of Plasma Processing Technology 1990 Noyes Publications Park Ridge
19. Y.P. Raiser Gas Discharge Physics 1997 Springer Berlin
20. B.D. Cullity Elements of X-Ray Diffraction 1967 Addison-Wesley