Standing wave reduction of positive and negative I-line resists

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue II, 2005, Pages 755-764

  Grandpierre, A G ^a   Schiwon, R ^a   Finger, F ^a   Schroder U P ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b INFINEON TECHNOLOGIES   (United States)

Author keywords

I line; Negative amplified resist; Positive resist; Standing waves

Indexed keywords

POST APPLY BAKE (PAB); POST EXPOSURE BAKE (PEB); PROFILE AMELIORATIONS; STANDING WAVE REDUCTION;

ANTIREFLECTION COATINGS; OPTIMIZATION; ULTRAVIOLET RADIATION;

STANDING WAVE METERS;

EID: 24644502659     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.596508     Document Type: Conference Paper

References (1)

1. Ralph Dammel, Diazonaphthoquinone-base Resists, SPIE Bellingham, 1993.