The effect of etching on low-stress mechanical properties of polypropylene fabrics under helium/oxygen atmospheric pressure plasma

Fibers and Polymers

Volumn 4, Issue 4, 2003, Pages 145-150

  Hwang, Yoon J ^b   An, Jae Sang ^c   McCord, Marian G ^b   Park, Shin Woong ^a   Kang, Bok Choon ^a  

^a Inha University   (South Korea)

^b NORTH CAROLINA STATE UNIVERSITY   (United States)

^c Korea Institute of Industrial Technology   (South Korea)

Author keywords

Atmospheric pressure plasma; KES FB; Polypropylene; SEM; XPS

Indexed keywords

EID: 24644488150     PISSN: 12299197     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02908270     Document Type: Article

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