Development of thermosets for thermal nanoimprint lithography at decreased temperatures

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 976-985

  Reuther, Freimut ^a   Kubenz, Mike ^a   Schuster, Christine ^a   Fink, Marion ^a   Vogler, Marko ^a   Gruetzner, Gabi ^a   Grimm, Juergen ^b   Kaeppel, Andi ^b  

^a MICRO RESIST TECHNOLOGY GMBH   (Germany)

^b Westsaechsische Hochschule Zwickau (FH)   (Germany)

Author keywords

Allyl polymers; Free radical initiators; Low imprinting temperature; Nanoimprint lithography; Plasticizers; Thermal pattern stability

Indexed keywords

HEATING; MONOMERS; NANOTECHNOLOGY; PLASTICIZERS; POLYMERIZATION; THERMAL EFFECTS; THERMODYNAMIC STABILITY;

ALLYL POLYMERS; FREE-RADICAL INITIATORS; LOW IMPRINTING TEMPERATURE; NANOIMPRINT LITHOGRAPHY; THERMAL PATTERN STABILITY;

LITHOGRAPHY;

EID: 24644486466     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600851     Document Type: Conference Paper

References (5)

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