Characterization analysis study of μ-bridge defect using simulation and wafer inspection tools

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue III, 2005, Pages 1383-1391

  Lee, Tae Yong ^a   Lee, Byoung Ho ^a   Chin, Soo Bok ^a   Cho, Do Hyun ^a   Song, Chang Lyong ^a   Fernandez, Jorge P ^b   Choi, Domingo ^b   Grella, Luca ^b  

^a SAMSUNG Electronics   (South Korea)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

bridge defect; Brightfield; Darkfield; EBI(e beam inspection)

Indexed keywords

BRIDGES; COMPUTER SIMULATION; DATA ACQUISITION; ELECTRON BEAMS; INSPECTION; ION BEAMS; MONTE CARLO METHODS; SCATTERING;

Μ-BRIDGE DEFECT; BRIGHTFIELD; DARKFIELD; E-BEAM INSPECTION (EBI);

DEFECTS;

EID: 24644481911     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.596473     Document Type: Conference Paper

References (2)

1. ITRS, The International Technology Roadmap for Semiconductors (2001).
2. Byoung-Ho Lee, Soo-Bok Chin, Do-Hyun Cho, Change-Lyong Song, Jeong-Ho Yeo, Daniel Some, and Silviu Reinhorn "Optical characterization of defects on pattern wafer: exploring light polarization", Proceedings of SPIE Vol. 5375, pp. 849-858, 2004