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Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 418-420

Subpicosecond and enhanced nanosecond PLD to grow ZnO films in nitrogen ambient

(7) Jelinek, M a Klini, A b Kocourek, T a Zeipl, R c Santoni, A d Fotakis, C b Kaminska, E e

a INSTITUTE OF PHYSICS (Czech Republic)

b INSTITUTE OF ELECTRONIC STRUCTURE AND LASER (Greece)

c INSTITUTE OF PHOTONICS AND ELECTRONICS (Czech Republic)

d ENEA (Italy)

e Department of Micro and Nanotechnology of Wide Bandgap Semiconductors (Poland)

Author keywords

Femtosecond laser; N doping; ZnO

Indexed keywords

CARRIER CONCENTRATION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; ENERGY DISPERSIVE SPECTROSCOPY; FILM GROWTH; LASER PULSES; NITROGEN; OXYGEN; PULSED LASER DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION CONDITIONS; FEMTOSECOND LASER; WAVELENGTH DISPERSIVE X RAY SPECTROSCOPY;

ZINC OXIDE;

COATING;

EID: 24644462730 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.02.020 Document Type: Article

Times cited : (9)

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