Advancing atomic nanolithography: Cold atomic Cs beam exposure of alkanethiol self-assembled monolayers

Journal of Physics: Conference Series

Volumn 19, Issue 1, 2005, Pages 109-117

  O'Dwyer, C ^a,b   Gay, G ^a   Viaris De Lesegno, B ^a,c   Weiner, J ^a   Mutzel M ^d   Haubrich, D ^d   Meschede, D ^d   Ludolph, K ^e   Georgiev, G ^e   Oesterschulze, E ^e  

^a Université Paul Sabatier   (France)

^b UNIVERSITY COLLEGE CORK   (Ireland)

^c LABORATOIRE AIMÉ COTTON   (France)

^d INSTITUT FÜR ANGEWANDTE PHYSIK   (Germany)

^e UNIVERSITY OF KASSEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 24644456107     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/19/1/019     Document Type: Conference Paper

References (15)

1. Schreiber F 2000 Prog. Surf. Sci. 65 151
2. Ulman A 1996 Chem. Rev. 96 1533
3. Meschede D and Metcalf H 2003 J. Phys. D.: Appl. Phys. 36 R17 and references therein
4. Camposeo A, Cervelli F, Piombini A, Tantussi F, Fuso F, Allegrini M and Arimondo E 2003 Mater. Sci. Eng. C 23 217
5. Cullit B D 1978 Elements of X-ray Diffraction (Reading: Addison-Wessely)
6. O'Dwyer C, Gay G, Viaris de Lesegno B and Weiner J 2004 Langmuir 20 8172
7. O'Dwyer C, Gay G, Viaris de Lesegno B, Weiner J, Ludolph K, Albert D and Oesterschulze E 2005 J. Appl. Phys. 97 114309
8. Mützel M, Müller M, Haubrich D, Rasbach U, Meschede D, O'Dwyer C, Gay G, Viaris de Lesegno B, Weiner J, Ludolph K, Georgiev G and Oesterschulze E 2005 Appl. Phys. B 80 941
9. Berger H 1976 Krist. Tech. 11 1171
10. Raub E and Muller K 1967 Fundamentals of Metal Deposition (Amsterdam: Elsevier) p 36-8
11. Nogués J, Costa L and Rao K V 1992 Physica A 182 532
12. Young R A and Willes D B 1982 J. Appl. Cryst. 15 430
13. Poirier G E and Tarlov M J 1994 Langmuir 10 285
14. Vollkopf A, Rudow O and Oesterschulze E 2001 J. Electrochem. Soc. 148 G587
15. Georgiev G, Müller-Wiegand M, Georgieva A, Ludolph K and Oesterschulze E 2003 J. Vac. Sci. Technol. B 21 1361