Spatial control of organic nanocrystal nucleation in sol-gel thin films for 3-D optical data storage devices or chemical multi-sensors

Journal of Crystal Growth

Volumn 283, Issue 3-4, 2005, Pages 444-449

  Botzung Appert, Estelle ^a   Zaccaro, Julien ^a   Gourgon, Cécile ^b   Usson, Yves ^c   Baldeck, Patrice L ^d   Ibanez, Alain ^a  

^a LABORATOIRE DE CRISTALLOGRAPHIE   (France)

^b CEA LETI   (France)

^c INSTITUT ALBERT BONNIOT   (France)

^d UNIV GRENOBLE ALPES   (France)

Author keywords

A1. Confined growth; A1. Optical data storage; B1. Nanocrystals; B1. Sol gel thin films; B3. Sensors

Indexed keywords

NANOSTRUCTURED MATERIALS; NUCLEATION; OPTICAL DATA STORAGE; SOL-GELS; SPIN COATING; THIN FILMS;

CONFINED GROWTH; NANOCRYSTALS; SOL-GEL THIN FILMS; SPATIAL CONTROL;

CHEMICAL SENSORS;

EID: 24644445566     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.06.049     Document Type: Article

References (20)

1. A. Ibanez, S. Maximov, A. Guiu, C. Chaillout, and P.L. Baldeck Adv. Mater. 10 1998 1540
2. N. Sanz, A.C. Gaillot, P.L. Baldeck, and A. Ibanez J. Mater. Chem. 10 2000 2723
3. J. Zaccaro, N. Sanz, E. Botzung Appert, P.L. Baldeck, and A. Ibanez C.R. Physique 3 2002 463
4. N. Sanz, A. Ibanez, Y. Morel, and P.L. Baldeck Appl. Phys. Lett. 78 2001 2569
5. F. Treussart, E. Botzung-Appert, N.T. Ha-Duong, A. Ibanez, J.F. Roch, and R. Pansu Chem. Phys. Chem. 4 2003 757
6. French patent no 02/08313 deposited 3rd July 2002, International extension deposited by 3rd July 2003.
7. C.J. Brinker, and G.W. Scherer Sol-Gel Science 1990 Academic Press New York
8. D. Turnbull, and J.C. Fisher J. Chem. Phys. 17 1945 71
9. P. Andreazza, F. Lefaucheux, and B. Mutafschiev J. Crystal Growth 92 1988 415
10. V.K. La Mer J. Am. Chem. Soc. 44 1952 1270
11. V.K. La Mer Indust. Eng. Chem. 44 1952 1270
12. M. Haruta, and B. Delmon J. Chim. Phys. 83 1986 859
13. D.E. Bornside, C.W. Macosko, and L.E. Scriven J. Appl. Phys. 66 1989 5185
14. D.A. Edwards A Mathematical Model of Trapping Skinning in Polymers, Studies in Applied Mathematics 1997 Massachusetts Institute of Technology, Blackwell Publishers Oxford p. 49
15. G. Lerondel, S. Setzu, M. Thonissen, and R. Romestain J. Imaging Sci. Technol. 41 1997 468
16. Silicon processing for the VLSI era, in:S. Wolf, R.N. Tauber(Eds.), Process technology, vol. 1. Lattice Press, 1986.
17. B. Suchod, and P.L. Baldeck Acta Cryst. C 51 1995 432
18. L.V. Bulgarovskaya, V.M. Vozzhennikov, S.B. Aleksandrov, and V.K. Bel'skii Fizikas-un Tehnisko-Zinatnu-Serija 4 1983 53
19. S.Y. Chou, P.R. Krauss, W. Zhang, L. Guo, and L. Zhuang J. Vac. Sci. Technol. B 15 1997 2897
20. S. Brasselet, V. Le Floc'h, F. Treussart, J.-F. Roch, J. Zyss, E. Botzung-Appert, and A. Ibanez Phys. Rev. Lett. 92 2004 207401