Investigations of silicon nitride layers deposited in pulsed microwave generated ammonia-silane plasmas

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 639-643

  Kruger J ^a   Schweitzer, U ^a   Schneider, J ^a   Schulz, A ^a   Walker, M ^a   Schumacher, U ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

Deposition; Optical spectroscopy; Pulsed microwave plasma; Silicon nitride

Indexed keywords

AMMONIA; DEPOSITION; FILMS; MICROWAVES; PLASMAS; SCANNING ELECTRON MICROSCOPY; SILANES; SPECTROSCOPY;

OPTICAL SPECTROSCOPY; PULSED MICROWAVE PLASMA;

SILICON NITRIDE;

PLASMA TREATMENT;

EID: 24644445132     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.01.112     Document Type: Article

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