Calibration of a dual probe NanoCaliper™ AFM for CD metrology

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue II, 2005, Pages 922-936

  McClure, Paul F ^a   Mancevski, Vladimir ^a  

^a Xidex Corporation   (United States)

Author keywords

Atomic force microscope; Calibration; Critical dimension; Dual probe; Metrology; NanoCaliper

Indexed keywords

CANTILEVER STIFFNESS; CRITICAL-DIMENSION ATOMIC FORCE MICROSCOPES (CD-AFM); SURFACE FORCE UNCERTAINTIES; TIP-TIP CALIBRATION;

ATOMIC FORCE MICROSCOPY; COMPUTATIONAL METHODS; PARAMETER ESTIMATION; UNCERTAIN SYSTEMS;

MEASUREMENT THEORY;

EID: 24644434948     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599063     Document Type: Conference Paper

References (4)

1. V. Mancevski and P. McClure, Calibration methods to remove probe shape effects from scanned probe measurements of semiconductor linewidth, Small Business Innovation Research (SBIR) project sponsored by the National Institute of Standards and Technology, Phase I, Contract No. SB1341-03-W-0807
2. D. Sarid, Exploring scanning probe microscopy with Mathematica, John Wiley & Sons, 1997, pg. 79.
3. Born and Wolf, Principles of Optics, Sixth Ed., Cambridge Univ. Press, 1997.
4. V. Mancevski and P. F. McClure, Development of a dual-probe Caliper™ CD-AFM for near model-independent nanometrology, Proc. of the SPIE, Metrology, Inspection and Process Control for Microlithography XVI, 4-7 March, 2002, Vol. 4689, pp. 83-91.