All-polymer ferroelectric transistors

Applied Physics Letters

Volumn 87, Issue 9, 2005, Pages

  Gelinck, G H ^a   Marsman, A W ^a   Touwslager, F J ^a   Setayesh, S ^a   De Leeuw, D M ^a   Naber, R C G ^b   Blom, P W M ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT MODULATIONS; FERROELECTRIC TRANSISTORS; RETENTION TIME; SEMICONDUCTOR CHANNELS;

ELECTRIC POTENTIAL; ELECTRODES; FERROELECTRICITY; ORGANIC COMPOUNDS; POLYSTYRENES; SEMICONDUCTING ORGANIC COMPOUNDS;

THIN FILM TRANSISTORS;

EID: 24644433140     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2035324     Document Type: Article

References (20)

1. H. E. A. Huitema, G. H. Gelinck, J. B. P. H. van der Putten, K. E. Kuijk, C. M. Hart, E. Cantatore, P. T. Herwig, A. J. J. M. van Breemen, and D. M. de Leeuw, Nature (London) 414, 599 (2001).
2. J. A. Rogers, Z. Bao, K. Baldwin, A. Dodabalapur, B. Crone, V. R. Raju, V. Kuck, H. Katz, K. Amundson, J. Ewing, and P. Drzaic, Proc. Natl. Acad. Sci. USA 98, 4835 (2001).
3. D. M. de Leeuw, G. H. Gelinck, T. C. T. Geuns, E. van Veenendaal, E. Cantatore, and B. H. Huisman, 2002 Int. Electron Device Meet. (IEDM) Tech. Dig. 293 (2002).
4. J. F. Scott, Ferroelectric Memories in Advanced Microelectronics (Springer, Berlin, 2000).
5. G. Velu, C. Legrand, O. Tharaud, A. Chapoton, D. Remiens, and G. Horowitz, Appl. Phys. Lett. 79, 659 (2001).
6. T. Kodzasa, M. Yoshida, S. Uemura, and T. Kamata, Synth. Met. 137, 943 (2003).
7. R. Schroeder, L. A. Majewski, and M. Grell, Adv. Mater. (Weinheim, Ger.) 16, 633 (2004).
8. K. N. Narayanan Unni, R. de Bettignies, S. Dabos-Seignon, and J.-M. Nunzi, Appl. Phys. Lett. 85, 1823 (2004).
9. Y. Matsuo, T. Ijichi, H. Yamada, J. Hatori, and S. Ikehata, Cent. Eur. J. Phys. 2, 117 (2004).
10. Th. B. Singh, N. Marjanoviæ, G. J. Matt, N. S. Sariciftci, R. Schwödiauer, and S. Bauer, Appl. Phys. Lett. 85, 5409 (2004).
11. Ferroelectric Polymers; Chemistry, Physics and Applications, edited, H. S. Nalwa, (Marcel Dekker, New York, 1995).
12. F. J. Touwslager, N. P. Willard, and D. M. de Leeuw, Appl. Phys. Lett. 81, 4556 (2002).
13. E. J. Meijer, D. M. De Leeuw, S. Setayesh, E. Van Veenendaal, B.-H. Huisman, P. W. M. Blom, J. C. Hummelen, U. Scherf, and T. M. Klapwijk, Nat. Mater. 2, 678 (2003).
14. H.-S. Xu, Z.-Y. Cheng, V. Bharti, S. Wang, and Q. M. Zhang, J. Appl. Polym. Sci. 75, 945 (2000).
15. H. E. Katz, X. M. Hong, A. Dodabalapur, and R. Sarpeshkar, J. Appl. Phys. 91, 1572 (2001).
16. S. L. Miller and P. J. McWhorter, J. Appl. Phys. 72, 5999 (1992).
17. J. C. Burfoot and G. W. Taylor, in Polar Dielectrics and their Applications (MacMillan, New York, 1979).
18. R. C. G. Naber, C. Tanase, P. W. M. Blom, G. H. Gelinck, A. W. Marsman, F. J. Touwslager, S. Setayesh, and D. M. de Leeuw, Nat. Mater. 4, 243 (2004).
19. R. C. G. Naber, P. W. M. Blom, A. W. Marsman, and D. M. de Leeuw, Appl. Phys. Lett. 85, 2032 (2004).
20. M. W. J. Prins, K.-O. Grosse-Holz, G. Muller, J. F. M. Cillessen, J. B. Giesbers, R. P. Weening, and R. M. Wolf, Appl. Phys. Lett. 68, 3650 (1996).