Several factors influencing nanofrictional properties of molecular deposition films

Mocaxue Xuebao/Tribology

Volumn 23, Issue 6, 2003, Pages 472-475

  Gao, Mang Lai ^a   Nie, Shi Chun ^b   Zhang, Si Wei ^a  

^a CHINA UNIVERSITY OF PETROLEUM   (China)

^b SINOPEC   (China)

Author keywords

Exposed terminated groups; Molecular deposition film; Nanofrictional properties; Surface charge; Topography

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC CHARGE; FRICTION; MORPHOLOGY; SUBSTRATES; SURFACE TOPOGRAPHY;

EXPOSED TERMINATED GROUPS; FRICTIONAL FORCE; MOLECULAR DEPOSITION FILM; NANOFRICTIONAL PROPERTIES; NORMAL DIRECTIONS; SCAN DIRECTIONS; SINGLE CRYSTAL SILICON; SURFACE CHARGE;

FILMS;

EID: 2442680692     PISSN: 10040595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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