Nanopolishing of silicon wafers using ultrafine-dispersed diamonds

Physics of the Solid State

Volumn 46, Issue 4, 2004, Pages 751-754

  Kurobe, T ^a   Fujimura, T ^a   Ikeda, H ^b  

^a Vision Development Company Limited   (Japan)

^b Inst Devmt Raw Mat/Indust T   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 2442611633     PISSN: 10637834     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.1711466     Document Type: Article

References (2)

1. V. Yu. Dolmatov, Russ. Chem. Rev. 70 (7), 607 (2001).
2. J. Ikeno, Y. Tani, and H. Sato, CIRP Ann. 39 (1), 341 (1990).