Effect of high valence metal doping on thermoelectric properties of [Ca2CoO3-δ]0.62CoO2

Materials Research Society Symposium - Proceedings

Volumn 793, Issue , 2003, Pages 317-322

  Fujie, K ^a   Horii, S ^a   Matsubara, I ^b   Shin, W ^b   Murayama, N ^b   Shimoyama, J ^a,c   Kishio, K ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT COMPOUNDS; DOPING (ADDITIVES); ELECTRIC CHARGE; ELECTRIC CONDUCTIVITY; SEEBECK EFFECT; SINTERING; STOICHIOMETRY; THERMOELECTRICITY;

HIGH VALENCE METAL DOPING; MAGNETIC ALIGNMENTS; METAL-DOPED COMPOUNDS; NONSTOICHIOMETRIES;

CALCIUM COMPOUNDS;

EID: 2442583430     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-793-s8.34     Document Type: Conference Paper

References (10)

1. I. Terasaki, Y. Sasago, and K. Uchinokura: Phys. Rev. B 56 (1997) R12685.
2. T. Ito, T. Kawata, T. Ktajima, and I. Terasaki: Proc. 17th Int. Conf. Thermoelectrics (ICT '98) (IEEE, Piscataway, 1999) p.595.
3. W. Shin and N. Murayama: J. Mater. Res. 15 (2002) 382.
4. A.C. Masset, C. Michel, A. Maignan, M. Hervieu, O. Toulemonde, F. Studer and B. Raveau: Phys. Rev. B 62 (2000) 166.
5. Y. Miyazaki, K. Kudo, M. Akoshima, Y. Ono, Y. Koike and T. Kajitani: Jpn. J. Appl. Phys. 39 (2000) L531.
6. R. Funahashi, I. Matsubara, H. Ikuta, T. Takeuchi, U. Mizutani and S. Sodeoka: Jpn. J. Appl. Phys. 39 (2000) L1127.
7. M. Sano, S. Horii, I. Matsubara, R. Funahashi, M. Shikano, J. Shimoyama and K. Kishio: Jpn. J. Appl. Phys. 42 (2003) L198.
8. S. Horii, I. Matsubara, M. Sano, K. Fujie, M. Suzuki, R. Funahashi, M. Shikano, W. Shin, N. Murayama, J. Shimoyama and K. Kishio: Jpn. J. Appl. Phys. 42 (2003) 7018.
9. J. Shimoyama, S. Horii, K. Otzschi, M. Sano and K. Kishio: Jpn. J. Appl. Phys. 42 (2003) L194.
10. W. Koshibae, K. Tsutsui and S. Maekawa: Phys. Rev. B 62 (2000) 6869.