Fabrication and electrical properties of pure VO 2 phase films

Journal of the Korean Physical Society

Volumn 44, Issue 4, 2004, Pages 884-888

  Chae, B G ^a   Youn, D H ^a   Kim, H T ^a   Maexg, S L ^a   Kang, K Y ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Laser ablation; Metal insulator transition; Oxygen partial pressure; Resistivity; VO 2 thin film

Indexed keywords

EID: 2442551660     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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