Quantitative analysis of cuprous oxide (Cu2O) films on copper surfaces using fourier transform infrared spectroscopy

R and D: Research and Development Kobe Steel Engineering Reports

Volumn 52, Issue 2, 2002, Pages 71-73

  Ohwaki, Takeshi ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COPPER COMPOUNDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SURFACE TREATMENT; THICKNESS MEASUREMENT;

COPPER SURFACES; CUPROUS OXIDES; OXIDE THICKNESS; SPECTRAL SIMULATION;

THIN FILMS;

EID: 2442537362     PISSN: 03738868     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (15)

1. T. N. Rhodin: J. Am. Chem. Soc., Vol.72 (1950), p.5102.
2. J. A. Allen: Trans. Faraday Soc., Vol.43 (1952), p.273.
3. S. M. Wilhelm et al.: Corros., Sci., Vol.22 (1982), p.791.
4. T. Farrel: Material Science, Vol.10 (1976), p.87.
5. S. K. Chawla et al.: Corrosion Science, Vol.33 (1992), p. 1617.
6. S. Suzuki et al.: Material Trans., JIM, Vol.38 (1997), p.1004.
7. G. W. Poling: J. Electrochem. Soc.: Solid State Science, Vol.116 (1969), p.958.
8. O. S. Heavens: Optical Properties of Thin Solid Films (1965), Chap.4, Dover Publications.
9. T. Ohwaki et al.: Characterization of Composite Materials (1994), Chap.9, Butterworth-Heinemann.
10. J. M. Machefert et al.: Surf. Interface Anal., Vol.17 (1991), p.137.
11. M. O'Keeffe: J. Chem. Phys., Vol.39 (1963), p.1789.
12. Von B Dold et al.: Optik, Vol.22 (1965), p.435.