LIGA for boomerang

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5276, Issue , 2004, Pages 307-317

  Lawes, R A ^a   Arthur, G G ^a  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED MANUFACTURING; COMPUTER SIMULATION; GLASS TRANSITION; HELIUM; IMAGE QUALITY; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; PHOTORESISTS; X RAYS;

BEAMLINES; BOOMERANG; STORAGE RING ENERGY; THERMAL DISTORTION;

SYNCHROTRON RADIATION;

EID: 2442534818     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.532759     Document Type: Conference Paper

References (3)

1. R.A. Lawes, G.G. Arthur, A. Schneider, LIGA: A Fabrication Technology for Industry? Proc. SPIE Vol. 4593 (2001):145-155.
2. B.L. Henke, AIP Conference Proceedings. No 75 (1981): 146
3. W. Ehrfeld, et al, Progress in deep-etch synchrotron radiation lithography, J.Vac. Sci. Technol. B6 (1) (1988): 178-182.