Influence of hydrogen plasma treatment on electrochemical behavior of moderately and highly boron doped diamond electrodes

Diamond and Related Materials

Volumn 13, Issue 4-8, 2004, Pages 1050-1053

  Simon, N ^a   Ballutaud, D ^b   Herlem, M ^a   Etcheberry, A ^a  

^a UNIVERSITÉ DE VERSAILLES SAINT QUENTIN EN YVELINES   (France)

^b CNRS   (France)

Author keywords

Diamond films; Electrodes; Hydrogenation; P type doping

Indexed keywords

BORON; CURRENT VOLTAGE CHARACTERISTICS; DOPING (ADDITIVES); ELECTROCHEMISTRY; ELECTRODES; HYDROGEN; PLASMA THEORY; SECONDARY ION MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTROCHEMICAL PROBES; HYDROGEN TREATMENT; PLASMA TREATMENT;

DIAMONDS;

DIAMOND;

EID: 2442526493     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.11.035     Document Type: Article

References (9)

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