In-plant performance comparison of Fourier transform and photoacoustic infra-red PFC monitors

TMS Light Metals

Volumn , Issue , 2004, Pages 381-385

  Dando, Neal R ^a   Xu, Weizong ^a   Espinoza Nava, Luis ^a  

^a ALCOA INC   (United States)

Author keywords

C2F6; CF4; Fourier transform infra red; FTIR; Hexafluoroethane; PAS; Perfluorooarbons; PFC; Photoacoustic; Tetrafluoromethane

Indexed keywords

ALUMINUM SMELTERS; C2F6; CF4; HEXAFLUOROETHANE; PAS; PERFLUROCARBONS; PFC; TERTRAFLUOROMETHANE;

ALUMINUM; DATA ACQUISITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED RADIATION; MONITORING; ORGANIC COMPOUNDS; SEMICONDUCTOR LASERS; SENSITIVITY ANALYSIS; SMELTING;

PHOTOACOUSTIC EFFECT;

EID: 2442489091     PISSN: 01470809     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. J. Marks, A. Tabereaux, D.Pape, V. Bakshi, and E. Dolin, "Factors Affecting PFC Emissions from Commercial Aluminum Reduction Cells," Light Metals, 2001, pp. 295-302.
2. H. Gamble, G. Mackay, D. Karecki, J. Pisano and H. Schiff, "Development of a TDLAS based methodology for Monitoring Perfluorocarbon Production During the Aluminum Smelting Process," Light Metals, 2001, 275-281.
3. H. Kvande, H. Nes and L. Vik, "Measurements of Perfluorocarbon Emissions from Norwegian Aluminum Smelters," Light Metals, 2001, pp. 289-294.
4. N. Dando, "In-Plant PFC Monitoring: Technology Options and Pberformance Concerns," Light Metals, 2003, pp. 183-186.