Machinable ceramic substrate for CVD diamond coating

Diamond and Related Materials

Volumn 13, Issue 4-8, 2004, Pages 819-822

  Abe, T ^a   Takagi, T ^b   Sun, Z M ^a   Uchimoto, T ^b   Makino, J ^b   Hashimoto, H ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Carbide; Coatings; Friction; Polishing

Indexed keywords

CERAMIC MATERIALS; CHEMICAL VAPOR DEPOSITION; FRICTION; SILICON CARBIDE; SINTERING; SUBSTRATES;

COEFFICIENT OF FRICTION; DIAMOND COATING; DIAMOND PLATES; MIXED POWDERS;

DIAMONDS;

CERAMIC COATING; COATING; FILM THICKNESS; FRICTION; POLISHING;

EID: 2442484704     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.10.044     Document Type: Article

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