Properties of BaTiO3 thin films deposited by radiofrequency beam discharge assisted pulsed laser deposition

Materials Science and Engineering: B

Volumn 109, Issue 1-3, 2004, Pages 160-166

  Canulescu, S ^a   Dinescu, G ^a   Epurescu, G ^a   Matei, D G ^a   Grigoriu, C ^a   Craciun, F ^b   Verardi, P ^b   Dinescu, M ^a  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b CNR   (Italy)

Author keywords

Barium titanate; Dielectric spectroscopy; Radiofrequency beam assisted pulsed laser deposition

Indexed keywords

AMORPHOUS FILMS; BARIUM TITANATE; CERAMIC MATERIALS; CHEMICAL VAPOR DEPOSITION; DIELECTRIC PROPERTIES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROMETERS; PERMITTIVITY; PIEZOELECTRICITY; PLASMA APPLICATIONS; PULSED LASER DEPOSITION; PYROELECTRICITY; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

DIELECTRIC SPECTROSCOPY; LASER MOLECULAR BEAM EPITAXY (LMBE); PLASMA DISCHARGE; RADIOFREQUENCY BEAM;

THIN FILMS;

EID: 2442482514     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2003.10.103     Document Type: Conference Paper

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