Atomic transport in insulators under high-flux heavy-ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 219-220, Issue 1-4, 2004, Pages 810-814

  Kishimoto, N ^a   Plaksin, O A ^a,b   Umeda, N ^c   Takeda, Y ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b SSC RF   (Russian Federation)

^c UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Atomic transport; Heavy ion; Ion induced photon; Nanoparticle; Silica glass

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; ELECTRIC INSULATORS; ELECTRIC POTENTIAL; FABRICATION; FUSED SILICA; HEAVY IONS; ION IMPLANTATION; MAGNESIA; PHOTONS; POSITIVE IONS; PRECIPITATION (CHEMICAL); SURFACE PLASMON RESONANCE; TRANSMISSION ELECTRON MICROSCOPY;

ATOMIC TRANSPORT; ION-INDUCED PHOTONS; OPTICAL RESPONSE;

NANOSTRUCTURED MATERIALS;

EID: 2442434376     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.01.168     Document Type: Conference Paper

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