Electron swarm parameters in SF6 and CF4 gas mixtures

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 43, Issue 3 A, 2004, Pages

  Xiao, Deng Ming ^a   Yang, Jing Lin ^a   Xu, Xin ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

CF4; Dielectric strength; Electron transport; Gas mixtures; SF6

Indexed keywords

CARBON INORGANIC COMPOUNDS; DIELECTRIC PROPERTIES; DIFFUSION; ELECTRON TRANSITIONS; GOLD; IONIZATION CHAMBERS; METALLIC FILMS; MIXTURES; PRESSURE EFFECTS; STAINLESS STEEL; STRENGTH OF MATERIALS; XENON;

DIELECTRIC STRENGTH; ELECTRON SWARM; ELECTRON TRANSPORT; GAS MIXTURES; SF6;

SULFUR COMPOUNDS;

EID: 2442428606     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.43.l369     Document Type: Article

References (8)

1. A. Zahoranová, J. Kúdelčík, J. Paillol and M. Ĉernák: J. Phys. D 35 (2002) 762.
2. D. M. Xiao, X. G. Li and X. Xu: J. Phys. D 34 (2001) L133.
3. L. G. Christophorou, P. G. Datskos and J. G. Carter: Nucl. Instrum. & Methods A 309 (1991) 160.
4. L. G. Christophoror and R. J. Van Brunt: IEEE Trans. Dielectr. Electr. Insul. 2 (1995) 952.
5. V. A. Lisovskiy and V. D. Yegorenkov: J. Phys. D 32 (1999) 2645.
6. D. M. Xiao, L. L. Zhu and Y. Z. Chen: J. Phys. D 32 (1999) L18.
7. J. Fan, S. Grzybowski, Y. Qiu and D. Xiao: Conf. Electr. Insul. & Dielectr. Phenomena, Annual Report (1995) 130.
8. X. G. Li, D. M. Xiao and S. J. Yang: Jpn. J. Appl. Phys. 40 (2001) L992.