Effect of diffusion in underpotential deposition: Simulated and experimental results

Journal of Electroanalytical Chemistry

Volumn 583, Issue 2, 2005, Pages 273-285

  Kirowa Eisner, E ^a   Gepshtein, R ^a   Gileadi, E ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

Diffusion control; Digital simulation; Frumkin isotherm; Polycrystalline silver; Underpotential deposition; Upd of lead

Indexed keywords

COMPUTER SIMULATION; CYCLIC VOLTAMMETRY; DEPOSITION; ISOTHERMS; POLYCRYSTALLINE MATERIALS;

DIFFUSION CONTROL; DIGITAL SIMULATION; FRUMKIN ISOTHERM; POLYCRYSTALLINE SILVER; UNDERPOTENTIAL DEPOSITION; UPD OF LEAD;

DIFFUSION;

EID: 24344448186     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2005.06.010     Document Type: Article

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