Oxide charge measurements in EEPROM devices

Microelectronics Reliability

Volumn 45, Issue 9-11, 2005, Pages 1514-1519

  De Nardi, C ^a   Desplats, R ^a   Perdu, P ^a   Beaudoin, F ^b   Gauffier, J L ^c  

^a CNES   (France)

^b THALES   (France)

^c INSA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DATA REDUCTION; ELECTRIC CHARGE;

ELECTRIC FORCE MICROSCOPY (EFM); GATE POTENTIALS; PROBING TECHNIQUES; SCANNING KELVIN PROBE MICROSCOPY (SKPM);

PROM;

EID: 24144491023     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2005.07.055     Document Type: Conference Paper

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