Control of drop positioning using chemical patterning

Applied Physics Letters

Volumn 87, Issue 2, 2005, Pages

  Dupuis, A ^a   Lopolds J ^a   Bucknall, D G ^a   Yeomans, J M ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL PATTERNING; DROP WETTING; DYNAMIC PATHWAYS;

COALESCENCE; HYDROPHOBICITY; NUMERICAL ANALYSIS; WETTING;

SURFACES;

EID: 24144489141     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1984098     Document Type: Article

References (8)

1. P. G. de Gennes, Rev. Mod. Phys. 57, 827 (1985).
2. R. Lipowsky, Curr. Opin. Colloid Interface Sci. 6, 40 (2001).
3. A. A. Darhuber and S. M. Troian, Annu. Rev. Fluid Mech. 37, 425 (2005).
4. N. P. Sandreuter, Tappi J. 77, 173 (1994).
5. J. W. Cahn, J. Chem. Phys. 66, 3667 (1977).
6. D. M. Anderson, G. B. McFadden, and A. A. Wheeler, Annu. Rev. Fluid Mech. 30, 139 (1998).
7. A. Dupuis and J. M. Yeomans, Langmuir 21, 2624 (2005).
8. J. Ĺopold̀s, A. Dupuis, D. G. Bucknall, and J. M. Yeomans, Langmuir 19, 9818 (2003).