Molecular simulation of gas adsorption in realistic models of silica nanopores

Annales de Chimie: Science des Materiaux

Volumn 30, Issue 4, 2005, Pages 375-383

  Coasne, Benoit ^a,b   Hung, Francisco R ^a   Siperstein, Flor R ^c   Gubbins, Keith E ^a  

^a North Carolina State University   (United States)

^b UNIVERSITÉ DE MONTPELLIER   (France)

^c UNIVERSITAT ROVIRA I VIRGILI   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; GAS ADSORPTION; ISOTHERMS; NANOSTRUCTURED MATERIALS; POROUS MATERIALS; SILICA; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL); XENON;

CAPILLARY CONDENSATION; ISOSTERIC HEAT; MOLECULAR SIMULATION; QUASI-REVERSIBLE MECHANISMS;

MOLECULAR DYNAMICS;

EID: 24144480881     PISSN: 01519107     EISSN: None     Source Type: Journal    
DOI: 10.3166/acsm.30.375-383     Document Type: Article

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