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Volumn 38, Issue 9, 2005, Pages 1331-1336

Low dielectric losses in annealed Ti-doped K(Ta,Nb)O3 thin films grown by pulsed laser deposition

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; DOPING (ADDITIVES); FILM GROWTH; HIGH TEMPERATURE EFFECTS; POTASSIUM COMPOUNDS; PULSED LASER DEPOSITION; REDUCTION; SUBSTITUTION REACTIONS; TEMPERATURE DISTRIBUTION; THIN FILMS; TITANIUM;

EID: 24144479457     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/9/001     Document Type: Article
Times cited : (8)

References (28)
  • 2
    • 85037792498 scopus 로고    scopus 로고
    • ed R Ramesh (Netherlands: Kluwer) chapter 1
    • Summerfelt S R 1997 Ferroelectric Thin Films ed R Ramesh (Netherlands: Kluwer) chapter 1, p 1
    • (1997) Ferroelectric Thin Films , pp. 1
    • Summerfelt, S.R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.