Electron and Atomic Force Microscopy studies of photocatalytic titanium dioxide thin films deposited by DC magnetron sputtering

Thin Solid Films

Volumn 490, Issue 2, 2005, Pages 112-117

  Acosta, Dwight R ^a   Martínez, Arturo ^a   Magaña, Carlos R ^a   Ortega, Jesús M ^a  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

Atomic force and electron microscopy; Magnetron sputtering; Photocatalysis; Titanium dioxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON MICROSCOPES; MAGNETRON SPUTTERING; ORGANIC COMPOUNDS; PHOTOCATALYSIS; SYNTHESIS (CHEMICAL); TITANIUM DIOXIDE;

BAND GAPS; GAS PRESSURES; STRUCTURAL DEFECTS; STRUCTURAL PROPERTIES;

THIN FILMS;

EID: 24044555227     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.04.067     Document Type: Conference Paper

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